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HomeMaterials Science ForumMaterials Science Forum Vol. 203Detailed Modeling of Barrel Chemical Vapor...

Detailed Modeling of Barrel Chemical Vapor Deposition Reactors

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Periodical:

Materials Science Forum (Volume 203)

Pages:

203-208

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.203.203

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Online since:

February 1996

Authors:

Maurizio Masi, S. Fogliani, S. Carrà

Keywords:

Barrel Reactor, Chemical Vapor Deposition (CVD), FIDAP, Modeling, Silicon

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© 1996 Trans Tech Publications Ltd. All Rights Reserved

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