An X-Ray Sensitive CCD Camera System and Its Application to the X-Ray Diffractometric Investigation on Area Selective Semiconductor Epitaxy

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Periodical:

Materials Science Forum (Volumes 210-213)

Edited by:

Anthony L. Bartos, Robert E. Green, Jr. and Clayton O. Ruud

Pages:

219-226

DOI:

10.4028/www.scientific.net/MSF.210-213.219

Citation:

F. Fandrich and R. Köhler, "An X-Ray Sensitive CCD Camera System and Its Application to the X-Ray Diffractometric Investigation on Area Selective Semiconductor Epitaxy", Materials Science Forum, Vols. 210-213, pp. 219-226, 1996

Online since:

May 1996

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$35.00

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