Substrate Influence on Topography and Chemical Composition of Thin Metal Films Produced by Means of Self-Ion Assisted Deposition

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Periodical:

Materials Science Forum (Volumes 248-249)

Edited by:

A.G. Balogh and G. Walter

Pages:

167-170

Citation:

I.S. Tashlykov et al., "Substrate Influence on Topography and Chemical Composition of Thin Metal Films Produced by Means of Self-Ion Assisted Deposition", Materials Science Forum, Vols. 248-249, pp. 167-170, 1997

Online since:

May 1997

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$38.00

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