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HomeMaterials Science ForumMaterials Science Forum Vols. 248-249Substrate Influence on Topography and Chemical...

Substrate Influence on Topography and Chemical Composition of Thin Metal Films Produced by Means of Self-Ion Assisted Deposition

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Materials Science Applications of Ion Beam Techniques

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Periodical:

Materials Science Forum (Volumes 248-249)

Pages:

167-170

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.248-249.167

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Online since:

May 1997

Authors:

I.S. Tashlykov, V. Vishnyakov, A. Wirth

Keywords:

Rubber, Self-Ion Assisted Deposition, Silicon, Thin Film

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© 1997 Trans Tech Publications Ltd. All Rights Reserved

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