Materials Science Applications of Ion Beam Techniques

Materials Science Applications of Ion Beam Techniques

Description:

The first particle accelerators were built in the early 1930’s. For a long time, these devices were used exclusively by nuclear physicists. In the 1960’s, extensive developments in measuring techniques occurred, mainly as a result of newly developed semiconductor devices. Further strong interest arose from the semiconductor industry, and ion implantation became widely accepted as being the ultimate tool for Si-based device fabrication.

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Info:

Editors:
A.G. Balogh and G. Walter
THEMA:
TGM
BISAC:
TEC021000
Details:
Proceedings of the International Symposium on Materials Science Applications of Ion Beam Techniques incorporating the 1st German-Australian Workshop on Ion Beam Analysis, Seeheim, Germany, September 1996
Pages:
512
Year:
1997
ISBN-13:
9780878497676
ISBN-13 (CD):
9783038598367
ISBN-13 (eBook):
9783035705201
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