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HomeMaterials Science ForumMaterials Science Forum Vols. 282-283Characterization of As Implanted Silicides by...

Characterization of As Implanted Silicides by Frequency Noise Level Measurements

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Advanced Materials and Processes: YUCOMAT '97

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Periodical:

Materials Science Forum (Volumes 282-283)

Pages:

153-156

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.282-283.153

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Online since:

May 1998

Authors:

M. Stojanović, M. Milosavljević, C. Jeynes

Keywords:

Implantation, Ion Beam, Noise Level Characterization, RBS, Silicide, Surface

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© 1998 Trans Tech Publications Ltd. All Rights Reserved

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