Organometallic Compounds as Precursors for Chemical Vapor Deposition of Thin Films of Inorganic Materials

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Periodical:

Materials Science Forum (Volumes 282-283)

Edited by:

Dragan P. Uskokovic, Slobodan K. Milonjic, Dejan I. Rakovic

Pages:

123-130

DOI:

10.4028/www.scientific.net/MSF.282-283.123

Citation:

P. Zanella et al., "Organometallic Compounds as Precursors for Chemical Vapor Deposition of Thin Films of Inorganic Materials", Materials Science Forum, Vols. 282-283, pp. 123-130, 1998

Online since:

May 1998

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$35.00

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