Paper Titles

Charge-Transfer Reactions between C₆₀ and Hydrophilic Solutes
p.93

New Materials on the Basis of Amino Derivatives of Fullerene C₆₀
p.101

Vibrational Properties and Structure of Carbon Nanotubes Based on C₆₀ Molecule and Its Symmetry
p.109

New Materials Based on Endohedral Fullerenes: Mo@C₆₀ Complex
p.115

Organometallic Compounds as Precursors for Chemical Vapor Deposition of Thin Films of Inorganic Materials
p.123

Optical Characterization of Mercury Cadmium Telluride Epitaxial Layers with Arbitrary Degree of Carrier Degeneracy
p.131

Investigations of TiN Films Optical and Mechanical Characteristics
p.139

Preparation of TiO₂ and ZnO Thin Films by Dip-Coating Method
p.147

Characterization of As Implanted Silicides by Frequency Noise Level Measurements
p.153

HomeMaterials Science ForumMaterials Science Forum Vols. 282-283Organometallic Compounds as Precursors for...

Organometallic Compounds as Precursors for Chemical Vapor Deposition of Thin Films of Inorganic Materials

Article Preview

Abstract:

You might also be interested in these eBooks

Advanced Materials and Processes: YUCOMAT '97

Info:

Periodical:

Materials Science Forum (Volumes 282-283)

Pages:

123-130

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.282-283.123

Citation:

Cite this paper

Online since:

May 1998

Authors:

P. Zanella, G.A. Battiston, G. Carta, R. Gerbasi, M. Porchia, G. Rossetto

Keywords:

MOCVD, Precursor, Synthesis, Thin Film

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 1998 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: