Characterization of Plasma Treated Al-Films by GIXR and GIXRD

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Periodical:

Materials Science Forum (Volumes 321-324)

Edited by:

R. Delhez, E.J. Mittemeijer

Pages:

406-410

DOI:

10.4028/www.scientific.net/MSF.321-324.406

Citation:

A. Quade and H. Wulff, "Characterization of Plasma Treated Al-Films by GIXR and GIXRD", Materials Science Forum, Vols. 321-324, pp. 406-410, 2000

Online since:

January 2000

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$35.00

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