Oxide and Nitride Thin Films: Processing and Characterization

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Periodical:

Materials Science Forum (Volumes 437-438)

Edited by:

M.O. Lai and L. Lu

Pages:

193-194

DOI:

10.4028/www.scientific.net/MSF.437-438.193

Citation:

H. Chen "Oxide and Nitride Thin Films: Processing and Characterization", Materials Science Forum, Vols. 437-438, pp. 193-194, 2003

Online since:

October 2003

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