Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz

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Materials Science Forum (Volumes 455-456)

Edited by:

Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias

Pages:

532-535

Citation:

L. Raniero et al., "Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz", Materials Science Forum, Vols. 455-456, pp. 532-535, 2004

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May 2004

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DOI: https://doi.org/10.1557/proc-666-f2.4