Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz

Abstract:

Article Preview

Info:

Periodical:

Materials Science Forum (Volumes 455-456)

Edited by:

Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias

Pages:

532-535

DOI:

10.4028/www.scientific.net/MSF.455-456.532

Citation:

L. Raniero et al., "Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz", Materials Science Forum, Vols. 455-456, pp. 532-535, 2004

Online since:

May 2004

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.