Physical Properties of Sputtered ITO and WO3 Thin Films

Abstract:

Article Preview

Info:

Periodical:

Materials Science Forum (Volumes 455-456)

Edited by:

Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias

Pages:

7-11

Citation:

H. N. Cui et al., "Physical Properties of Sputtered ITO and WO3 Thin Films", Materials Science Forum, Vols. 455-456, pp. 7-11, 2004

Online since:

May 2004

Export:

Price:

$38.00

[1] C. M. Lampert, Sol. Energy Mater. Sol. Cells Vol. 52 (1998), p.207.

[2] C. G. Granqvist, Electrochimica Acta Vol. 44 (1999), p.3005.

[3] A. W. Czanderna, Sol. Energy Mater. Sol. Cells Vol. 56 (1999), p.419.

[4] K. Bange, Energy Mater. Sol. Cells Vol. 58 (1999), p.1.

[5] F. O. Adurodija, H. lzurni, T. lshihara, H. Yoshioka, and M. Motoyama, J. Vac. Sci. Technol. A Vol. 18(3), (2000), p.814.

[6] Hai-Ning Cui, V. Teixeira, A. Monteiro, Vacuum Vol. 67 (3-4), (2002), p.589.

[7] Hai-Ning Cui and Shi-Quan Xi, Thin Solid Films Vol. 288 (1996), p.325.

[8] S. Takaki, K. Matsumoto, and K. Suzuki, Appl. Surf. Sci. Vol. 33/34 (1988), p.91.

[9] K. D. Lee, Thin Solid Films Vol. 302 (1997), p.84.

[10] N. Dourelov, D. Gogova, M Misheva, Thin Solid Films Vol. 347 (1999) p.302.

[11] M. Bender, W. Seelig, C. Daube, H. Frankenberger, B. Ocker, J. Stollenwerk, TSF Vol. 326 (1998), p.72.

[12] K.H. Guenther, P.G. Wieder and J.M. Bennett, Appl. Op. Vol. 23 (1984), p.3820.

[13] H.E. Bennett and J. O. Porteus, J. Opt. Soc. Am., 51(1961) 123.

[14] M. Bender, W. Seelig, C. Daube. H. Frankenberaer . B. Ocker. J. Stollenwerk, TSF Vol. 326 (1998), p.72.

[15] J. M. Correia-Pires, J. B. Almeida, V. Teixeira, Key Engineering, Editor: Teresa Vieira (Trans Tech Publications, Switzerland 2001), p.388.

Fetching data from Crossref.
This may take some time to load.