Physical Properties of Sputtered ITO and WO3 Thin Films

Hai Ning Cui; Vasco Teixeira; A.C. Monteiro; Elvira Fortunato; Rodrigo Martins; E. Bertran

doi:10.4028/www.scientific.net/MSF.455-456.7

Paper Titles

Preface

Advances in Electrochromic Materials and Devices
p.1

Physical Properties of Sputtered ITO and WO₃ Thin Films
p.7

ZnO:Ga Thin Films Produced by RF Sputtering at Room Temperature: Effect of the Power Density
p.12

Effect of Thermal Treatment on the Properties of Sol-Gel Derived Al-Doped ZnO Thin Films
p.16

KrF Laser CVD of Chromium Oxide by Photodissociation of Cr(CO)₆
p.20

Deposition of SiO₂ and SiO₂:Ge Films for Optical Applications in a Matrix Distributed Electron Cyclotron Resonance Reactor
p.25

Structural and Dielectric Characteristics of Ba₂MeWO₆ (Me=Mg, Ni, Zn) Double Perovskites
p.30

Microstructure and Electrical Properties of SrBi₂Ta₂O₉ Ceramics Processed by Templated Grain Growth
p.35

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Physical Properties of Sputtered ITO and WO₃ Thin Films

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Materials Science Forum (Volumes 455-456)

Pages:

7-11

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.455-456.7

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Online since:

May 2004

Authors:

Hai Ning Cui, Vasco Teixeira, A.C. Monteiro, Elvira Fortunato, Rodrigo Martins, E. Bertran

Keywords:

DC Sputtering, Electrical Properties, Optical Property, Oxide, Thin Film, WO₃

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