ZnO:Ga Thin Films Produced by RF Sputtering at Room Temperature: Effect of the Power Density

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Periodical:

Materials Science Forum (Volumes 455-456)

Edited by:

Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias

Pages:

12-15

DOI:

10.4028/www.scientific.net/MSF.455-456.12

Citation:

E. Fortunato et al., "ZnO:Ga Thin Films Produced by RF Sputtering at Room Temperature: Effect of the Power Density", Materials Science Forum, Vols. 455-456, pp. 12-15, 2004

Online since:

May 2004

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$35.00

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