Influence of Deposition Processing Conditions on Polycrystalline Silicon Thin Film for Solar Cells on Ceramic Substrates

Abstract:

Article Preview

Various polycrystalline silicon thin films were deposited on Al2O3 ceramic substrates by RTCVD processing under different deposition conditions. The influence of deposition conditions on thin film quality was studied and a set of typical processing parameters were obtained, which would direct the RTCVD processing of thin film silicon solar cell technique.

Info:

Periodical:

Materials Science Forum (Volumes 475-479)

Main Theme:

Edited by:

Z.Y. Zhong, H. Saka, T.H. Kim, E.A. Holm, Y.F. Han and X.S. Xie

Pages:

1231-1234

Citation:

H. F. Li et al., "Influence of Deposition Processing Conditions on Polycrystalline Silicon Thin Film for Solar Cells on Ceramic Substrates", Materials Science Forum, Vols. 475-479, pp. 1231-1234, 2005

Online since:

January 2005

Export:

Price:

$38.00

[1] M.E. Nell, Solar cells from thin silicon layers on Al2O3, Solar Energy Materials & Solar Cells 69 (2001) , pp.115-121.

DOI: https://doi.org/10.1016/s0927-0248(00)00384-6

[2] Shimokawa, Ryuichi, 2µm thin film c-Si cells on near-Lambertian Al2O3 substrates, Solar Energy Materials & Solar Cells, 65 (2001).

DOI: https://doi.org/10.1016/s0927-0248(00)00146-x