Laser CVD Process for High Speed Deposition of YSZ Films
p.1213
p.1213
Preparation of Rutile and Anatase TiO2 Films by MOCVD
p.1219
p.1219
A Study on the Preparation of TiO2-xNx Films by Reactive Deposition and Their Absorption Properties in Visible Region
p.1223
p.1223
Study on the Cracking of SiO2-TiO2 Films Prepared by Sol-Gel Method
p.1227
p.1227
Influence of Deposition Processing Conditions on Polycrystalline Silicon Thin Film for Solar Cells on Ceramic Substrates
p.1231
p.1231
Synthesis of Titanium Dioxide Nanotubes by Ion Exchange Approach
p.1235
p.1235
Synthesis and Growth Mechanism of Silicon Nitride Nanostructures
p.1239
p.1239
Synthesis and Properties of Ti3SiC2/SiC Ceramic Composites
p.1243
p.1243
Fabrication of Ti3AlC2 Powder with High-Purity by Pressureless Sintering
p.1247
p.1247
Influence of Deposition Processing Conditions on Polycrystalline Silicon Thin Film for Solar Cells on Ceramic Substrates
Abstract:
Various polycrystalline silicon thin films were deposited on Al2O3 ceramic substrates by RTCVD processing under different deposition conditions. The influence of deposition conditions on thin film quality was studied and a set of typical processing parameters were obtained, which would direct the RTCVD processing of thin film silicon solar cell technique.
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Periodical:
Materials Science Forum (Volumes 475-479)
Pages:
1231-1234
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Online since:
January 2005
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© 2005 Trans Tech Publications Ltd. All Rights Reserved
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