TEM and TEM-EDX Analysis of Cross-Section of Anti-Reflective Thin Film and Glass Substrate

Xin Gang Yu; Hong Wen Ma; Yanbin Zuo; Hui Feng Zhao; Wu Wen Luo; Wenrue Bi; Li Wang

doi:10.4028/www.scientific.net/MSF.475-479.1579

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HomeMaterials Science ForumMaterials Science Forum Vols. 475-479TEM and TEM-EDX Analysis of Cross-Section of...

TEM and TEM-EDX Analysis of Cross-Section of Anti-Reflective Thin Film and Glass Substrate

Abstract:

Two-layer antireflective films were prepared on Na-Mg-Ca-Si glass substrate by sol-gel process starting from metal alkoxides: Si(OC2H5)4, Ti(OC4H9)4. The transmittance of glass was increased obviously (>95%), the reflective index was reduced to 1.95 through visible light range. TEM observation showed that SiO2 film is compactly joined to TiO2 film and TiO2 film to the substrate. TEM-EDX analysis of the films, film-substrate interface and substrate revealed that with the increase of Ti content, the content of Mg，Ca and Si decreases, however, the content of Na increases. The diffuse of Na+ from the substrate to the film is negative diffusion.