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Electron Wind Induced Mass Transport in Sub-Micrometer Size Wires
Abstract:
Nanoscale metallic wires play a pivotal role in future microelectronics. Extremely high current densities, present in silicon-based integrated circuits, cause wire destruction by electron-wind induced atomic migration and void formation. In the present paper we elaborate a theoretical model, which describes the interaction of impurity-vacancy pairs. Criteria are given for an optimum material selection, based on the atomic valence of matrix and alloying metal, which reduce (or enhance) the probability of void formation.
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463-468
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Online since:
March 2005
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© 2005 Trans Tech Publications Ltd. All Rights Reserved
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