Oxidation of SiOC Composite Having Dispersoids of Mo4.8Si3C0.6 and MoSi2

Abstract:

Article Preview

New ceramic composites that consist of the amorphous SiOC matrix having dispersoids of Mo4.8Si3C0.6 and some MoSi2 were synthesized, and their oxidation characteristics were investigated between 450 and 1050oC in air. The SiOC matrix was obtained by converting polymethylsiloxane via pyrolysis. The good oxidation resistance of the prepared composites originated from a thin, protective SiO2 layer formed on the surface. But the outermost oxide surface was porous, owing to the formation of the highly volatile MoO3, which was formed together with SiO2.

Info:

Periodical:

Materials Science Forum (Volumes 486-487)

Edited by:

Hyung Sun Kim, Sang-Yeop Park, Bo Young Hur and Soo Wohn Lee

Pages:

165-168

Citation:

D. B. Lee and S. W. Woo, "Oxidation of SiOC Composite Having Dispersoids of Mo4.8Si3C0.6 and MoSi2 ", Materials Science Forum, Vols. 486-487, pp. 165-168, 2005

Online since:

June 2005

Export:

Price:

$38.00

[1] P. Greil: J. Am. Ceram. Soc. Vol. 78 (1995), p.835.

[2] C. Müller, P. Greil, K. Bundschuh and M. Schütze: Ceramic Trans. Vol. 85 (1998), p.393.

[3] D. B. Lee, D. J. Kim: Oxid. Met. Vol. 61 (2004), p.423.

[4] J. Cook, A. Khan, E. Lee and R. Mahapatra: Mater. Sci. Eng. Vol. A155 (1992), p.83.

[5] J. B. Berkowitz-Mattuck, R. R. Dils: J. Electrochem. Soc. Vol. 112 (1965), p.583.

[6] T. Erny, M. Seibold, O. Jarchew, P. Greil: J. Am. Ceram. Soc. Vol. 76 (1993), p.207.

[7] C. D. Wirkus, and D. R. Wilder: J. Am. Ceram. Soc., Vol. 49 (1966), p.173.

[8] T. Maruyama, K. Yanagihara: Mater. Sci. Eng. Vol. A239 (1997), p.828.

[10] [20] [30] [0] D C.

[0] Mo O Si D C 10µm (b).

[10] [10] [60] [0] F E.

[0] Mo O Si E F 10µm (c) 900oC/50hr Counts (x10) Counts (x10) Counts (x10).

[10] [50] [0] [60] B A.

[0] Mo Scale Si A B 50µm (a) 600oC/50hr epoxy Scale Matrix epoxy Matrix Scale Matrix Scale epoxy O Matrix Scale Matrix Scale Matrix 1050oC/50hr.

DOI: https://doi.org/10.1007/bf02763001

[10] [20] [30] [0] D C.

[0] Mo O Si D C 10µm (b).

[10] [10] [60] [0] F E.

[0] Mo O Si E F 10µm (c) 900oC/50hr Counts (x10) Counts (x10) Counts (x10).

[10] [50] [0] [60] B A.

[0] Mo Scale Si A B 50µm (a) 600oC/50hr epoxy Scale Matrix epoxy Matrix Scale Matrix Scale epoxy O Matrix Scale Matrix Scale Matrix 1050oC/50hr Fig. 4. SEM cross-sectional image and the corresponding EDS line profiles of SiOC/Mo4. 8Si3C0. 6/MoSi2 composite after oxidation for 50 hr. (a) 600 oC, (b) 900 o C, and (c) 1050 oC.

DOI: https://doi.org/10.4271/ams3903/6a