A Monte Carlo Model for Analyzing the Effects on Radiometric Temperature Measurement in Rapid Thermal Processor

Abstract:

The radiometric temperature measurement is often applied to the in-situ and real-time monitor for rapid thermal processing of semiconductor wafer. To obtain good accuracy, the effective emissivity of measured spot is determined simultaneously as well. However, the effective emissivity strongly depends on the characteristics of wafer, processing chamber, and sensors. This paper presents a Monte Carlo model with bi-directional reflection distribution function to estimate the related effective emissivity of wafer. The ends of radiation thermometer considered are located either on the inner surface of processing chamber or at the proximity of wafer. The results are checked and compared with those of the previous work. Finally the primary effects on radiometric temperature measurement are analyzed and discussed.

• Periodical: Materials Science Forum (Volumes 505-507)
• Pages: 325-330
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.505-507.325
• Online since: January 2006
• Authors: Jen Chieh Tsao, Chiung Chieh Su
• Keywords: BRDF, Monte Carlo Model, Radiometric Temperature Measurement, RTP

References

[1] A. Agarwal, A.T. Fidry, and H.L. Gossmann, Semicond. Int., 22(5), 71 (1999).

[2] Y. Baharav, Y. Ish-Shalom, G. Jackson, Business Briefing, Semicond. Manuf. Tech. (1998).

[3] B.K. Tsai and D.P. Dewitt, Proc. 7th Int. Conf. Adv. Therm. Process. Semicond., 125 (1999).

[4] Z.M. Zhang and Y.H. Zhou, Int. J. Thermophys., 22, 1563 (2001).

[5] A. Ono, J. Opt. Soc. Am., 70(5), 547(1980).

[6] V.I. Sapritsky and A.V. Prokhorov, Metrologia, 29, 9 (1992).

[7] Y.H. Zhou, Y.J. Shen, Z.M. Zhang, B.K. Tsai, D.P. DeWitt, Int. J. Heat Mass Transfer, 45, 1945 (2002).

[8] Y.H. Zhou, Z.M. Zhang, D.P. DeWitt, and B.K. Tsai, Proc. 9th Int. Conf. Adv. Therm. Process. Semicond. (2001).

[9] B. Adms, A. Hunter, M. Yam, and B. Peuse, Proc. 197th ESC Meeting, 363 (2000).

[10] K.G. Kreider, D.H. Chen, D.P. DeWitt, W.A. Kimes, and B.K. Tsai, Proc. 11th Int. Conf. Adv. Therm. Process. Semicond. (2003).

[11] D.P. DeWitt and G.D. Nutter, Theory and Practice of Radiation Thermometry, 1st edition, New York: John Wily & Sons, Inc. (1988).

[12] M.F. Modest, Radiative heat transfer, 4th ed., McGraw Hill, New York (2003).

[13] P. Beckmann and A. Spizzichino, The Scattering of Electronic Waves from Rough Surfaces, Pergamon, Oxford, UK (1963).

[14] K.E. Torrance and E.M. Sparrow, J. Opt. Soc. Am., 57, 1105 (1967).

[15] G.J. Ward, Computer Graphics, 26, 265 (1992).

[16] L. Neumann, A. Neumann, and L. Szirmay Kalos, EUROGRAPHICS "99, 18, C-161 (1999).

[17] R.L. Cook and K.E. Torrance, Computer Graphics, 15(3), 307 (1981).

[18] C. Jacoboni and L. Reggiani, Reviews of Modern Physics, 55(3), 645 (1983).

[19] C.W. Meyer, D.W. Allen, D.P. DeWitt, K.G. Kreider, F.J. Lovas, B.K. Tsai, Proc. 7th Int. Conf. Adv. Therm. Process. Semicond., 136 (1999).