Design of Automatic Matching System for Very High Frequency Plasma-Enhanced Processes
Since it can change electron energy distribution functions, very high frequency (VHF) plasma has gained significant attention as a promising new class of plasma. We demonstrate an automatic matching system for VHF plasma, that works in very wide ranges. A matching system was prepared using conventional variable capacitors. Reflection coefficient at the input of the matching circuits was measured with a directional coupler. A new calculation method for automatic matching based on numerical models for the circuit was developed, and the performance of the automatic matching system was evaluated using a load emulator. These results revealed that the system has an automatic matching capability for the entire range of the covering load area.
Yukichi Umakoshi and Shinji Fujimoto
Y. Yoshizako and D. Matsuno, "Design of Automatic Matching System for Very High Frequency Plasma-Enhanced Processes", Materials Science Forum, Vol. 512, pp. 239-242, 2006