Design of Automatic Matching System for Very High Frequency Plasma-Enhanced Processes

Abstract:

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Since it can change electron energy distribution functions, very high frequency (VHF) plasma has gained significant attention as a promising new class of plasma. We demonstrate an automatic matching system for VHF plasma, that works in very wide ranges. A matching system was prepared using conventional variable capacitors. Reflection coefficient at the input of the matching circuits was measured with a directional coupler. A new calculation method for automatic matching based on numerical models for the circuit was developed, and the performance of the automatic matching system was evaluated using a load emulator. These results revealed that the system has an automatic matching capability for the entire range of the covering load area.

Info:

Periodical:

Edited by:

Yukichi Umakoshi and Shinji Fujimoto

Pages:

239-242

DOI:

10.4028/www.scientific.net/MSF.512.239

Citation:

Y. Yoshizako and D. Matsuno, "Design of Automatic Matching System for Very High Frequency Plasma-Enhanced Processes", Materials Science Forum, Vol. 512, pp. 239-242, 2006

Online since:

April 2006

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Price:

$35.00

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