Strains, Stresses and Elastic Properties in Polycrystalline Metallic Thin Films: In Situ Deformation Combined with X-Ray Diffraction and Simulation Experiments

Philippe Goudeau; Damien Faurie; Baptiste Girault; Pierre Olivier Renault; Eric Le Bourhis; Pascale Villain; Frederic Badawi; Olivier Castelnau; Rénald Brenner; Jean Luc Béchade; G. Geandier; Nobumichi Tamura

doi:10.4028/www.scientific.net/MSF.524-525.735

Paper Titles

Stress Factors and Absolute Residual Stresses in Thin Films Determined by the Combination of Curvature and sin²ψ Methods
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Effect of Surface Nano Crystallization on Tribological Properties of Stainless Steel
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Stresses Analysis on Coarse Grain Zn Film during Tensile Loading
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Scratch Test of TiCN Thin Films with Different Preferred Orientation
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Strains, Stresses and Elastic Properties in Polycrystalline Metallic Thin Films: In Situ Deformation Combined with X-Ray Diffraction and Simulation Experiments
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Oxford HEXameter: Laboratory High Energy X-Ray Diffractometer for Bulk Residual Stress Analysis
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A New Type of X-Ray Diffractometer with Cooperating Robots for Residual Stress Analysis on Large Components
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Effect of Detector Width and Peak Location Technique on Residual Stress Determination in Case of Work-Hardened Materials
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Specific Corrections Associated to Linear CCD Detectors Used in X-Ray Diffraction
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HomeMaterials Science ForumMaterials Science Forum Vols. 524-525Strains, Stresses and Elastic Properties in...

Strains, Stresses and Elastic Properties in Polycrystalline Metallic Thin Films: In Situ Deformation Combined with X-Ray Diffraction and Simulation Experiments

Abstract:

X-ray diffraction is used in combination with tensile testing for measuring elastic properties of metallic thin films. Size effect, elastic anisotropy and grain morphologies are considered in all these experiments and supported by different kind of numerical simulations operating at different length scales. Such instrumental studies are time consuming even if synchrotron sources are used. New experiments are under progress for reducing acquisition data and improving precision on strain measurements. After introducing briefly the main principles and results of our techniques, first promising measurements on nanometric W/Cu multilayers using 2D CCD detectors and high monochromatic flux at the Advanced Light Source Berkeley (USA) on beam line 11.3.1 are presented. In addition, simulation experiments for analyzing elasticity in textured gold film are discussed.

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Periodical:

Materials Science Forum (Volumes 524-525)

Pages:

735-740

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.524-525.735

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Online since:

September 2006

Authors:

Philippe Goudeau, Damien Faurie, Baptiste Girault, Pierre Olivier Renault, Eric Le Bourhis, Pascale Villain, Frederic Badawi, Olivier Castelnau, Rénald Brenner, Jean Luc Béchade, G. Geandier, Nobumichi Tamura

Keywords:

Diffraction, Elasticity, Simulation, Size Effect, Synchrotron, Tensile Testing, Thin Film

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