Microstructure and Bonding Strength of Tungsten Coating Deposited on Copper by Plasma Spraying

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Abstract:

Tungsten coatings with different interlayers onto the oxygen-free copper substrates were fabricated by atmosphere plasma spraying. The effects of different interlayers of NiCrAl, NiAl and W/Cu on bonding strength were studied. SEM, EDS and XRD were used to investigate the photographs and compositions of these coatings. The tungsten coatings with different initial particle sizes resulted in different microstructures. Oxidation was not detected in the tungsten coating, but in the interlayer, it was found by both XRD and EDS. The tungsten coating deposited directly onto the copper substrate presented higher bonding strength than those with different interlayers.

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Materials Science Forum (Volumes 534-536)

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425-428

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January 2007

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© 2007 Trans Tech Publications Ltd. All Rights Reserved

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[1] H. Bolt, V. Barabash, W. Krauss, et al, J. Nucl. Mater. Vol. 329-33 (2004), p.66.

Google Scholar

[2] M. Shimada, A.E. Costley, G. Federici, et al, J. Nucl. Mater. Vol. 337-339 (2005), p.808.

Google Scholar

[3] V. Barabash, G. Federici, J. Linke et al, J. Nucl. Mater. Vol. 313 (2003), p.42.

Google Scholar

[4] H. Bolt, V. Barabash, G. Federici et al, J. Nucl. Mater. Vol. 43 (2002), p.307.

Google Scholar

[5] M. Roedig, W. Kuehnlein, J. Linke, et al, Fus. Eng. Des. Vol. 61-2 (2002), p.135.

Google Scholar

[6] I. Smid, M. Akiba, G. Vieider, et al, J. Nucl. Mater. Vol. 263 (1998), p.160.

Google Scholar

[7] J. Boscary, S. Suzuki, K. Nakamura, et al, Fus. Eng. Des. Vol. 39-4 (1998), p.537.

Google Scholar

[8] K. Nakamura, S. Suzuki, T. Tanabe, et al, Fus. Eng. Des. Vol. 39-4 (1998), p.295.

Google Scholar

[9] H. Maier, in: The Fifth Pacific Rim International Conference on Advanced Materials and Processing, Beijing, China (2005), p.1377.

Google Scholar

[10] X. Liu, S. Tamura, K. Tokunaga, et al, Plasm. Sci. Tech. Vol. 5 (2003), p.1887.

Google Scholar