Ultra-Large Area RF Plasma Sources Employing Multiple Low-Inductance Internal-Antenna Modules for Flat Panel Display Processing

Abstract:

Plasma-generation and control technologies for meters-scale ultra-large-area RF plasma sources have been developed with multiple low-inductance antenna (LIA) modules, as a promising candidate of ultra-large area and high-density (1011-1012 cm-3) plasma sources for next-generation large-area processing. The present technologies are based on principle of multiple operation and integrated control of LIA modules, which enables effective control of power deposition profiles and hence the plasma uniformity over meters-scale large area for processing. This paper presents issues in designing ultra-large-area plasma sources to demonstrate feasibility of the uniform sources with 3m x 3m scales to meet requirements in the next-generation processes.

• Periodical: Materials Science Forum (Volumes 561-565)
• Pages: 1237-1240
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.561-565.1237
• Online since: October 2007
• Authors: Yuichi Setsuhara, Kosuke Takenaka, Daisuke Tsukiyama, Kazuaki Nishisaka, Akinori Ebe
• Keywords: Inductively Coupled Plasma, Large Area Plasma, Meters-Scale Processing, Plasma-Profile Control

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