Application of Dynamic Masking on Rapid Prototyping

Chien Nan Chen; Sheng Jye Hwang; Huei Huang Lee; Durn Yuan Huang

doi:10.4028/www.scientific.net/MSF.594.261

Paper Titles

Fast Nanometer Positioning of Heavy Loads Using a Hybrid Driver
p.235

Formability of the Layer Additive Ceramic Part
p.241

Evaluation of FDM Rapid Prototyping with ABSi Material for Airfoil Design
p.249

Evaluation of Surface Finish Affect on Aerodynamic Coefficients of Wind Tunnel RP Models Production with ABSi Material
p.255

Application of Dynamic Masking on Rapid Prototyping
p.261

The Application of Rapid Prototyping for the Design and Manufacturing of Transtibial Prosthetic Socket
p.273

The Influence of Sintering Temperature on the Performance of Dye-Sensitized Solar Cell
p.281

Experimental Analysis for the Low-Temperature Growth of Poly-Si Films by Using Double Excimer Laser
p.299

Macro-Micro Modeling Analysis of Melting and Re-Solidification of Thin Si Films by Excimer Laser Annealing
p.306

HomeMaterials Science ForumMaterials Science Forum Vol. 594Application of Dynamic Masking on Rapid...

Application of Dynamic Masking on Rapid Prototyping

Abstract:

In rapid prototyping (RP) technologies, curing of UV-curable photopolymers is mainly achieved by the application of laser scanning with limited fabrication speed. The dynamic masking approach can improve the fabrication speed; however, current researches and available systems cure photopolymers with visible light rather than UV light. In this research, we have attempted to develop a UV dynamic masking RP system by implementing digital micro-mirror device (DMD) from digital light processing (DLP) technology and TFT liquid crystal display (LCD) panel. A DLP projector was disassembled and the main components were then recombined to form a dynamic mask generator. Thus, this study has shown the feasibility of obtaining a UV dynamic masking RP system that may be integrated for a UV-curable material processing.