Effective of SiO2 Addition on the Self-Cleaning and Photocatalytic Properties of TiO2 Films by Sol-Gel Process

Abstract:

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Thin films of various composition in the system of TiO2•SiO2 have been fabricated by the sol-gel process using Si(OC2H5) and Ti(OC3H7i)4 as precursors. TiO2•SiO2 films were formed on the glass substrate by spin-coating technique and heated at 500°C for 1 h. The relationship between hydrophilicity, photocatalytic properties and self-cleaning property with SiO2 addition and UV light irradiation were investigated. Photocatalytic activity of TiO2•SiO2 films showed decomposition of ~97% of acetaldehyde in 2 h and a water contact angle of ~10°. TiO2•SiO2 films can have more hydrophilic activity and less photocatalytic activity by increasing of SiO2 addition. XPS measurements revealed that the amount of organic compounds adsorbed on the films decreased with the UV light irradiation and SiO2 addition, because of the increased of both OH group contents in films and decomposed organic contaminants of the films surface.

Info:

Periodical:

Materials Science Forum (Volumes 620-622)

Edited by:

Hyungsun Kim, JienFeng Yang, Tohru Sekino and Soo Wohn Lee

Pages:

679-682

DOI:

10.4028/www.scientific.net/MSF.620-622.679

Citation:

D. Y. Shin and K. N. Kim, "Effective of SiO2 Addition on the Self-Cleaning and Photocatalytic Properties of TiO2 Films by Sol-Gel Process", Materials Science Forum, Vols. 620-622, pp. 679-682, 2009

Online since:

April 2009

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$35.00

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