Study on the Evolution of Surface Morphology of Hetero-Epitaxy Growth of ZnO Thin Film

Jing Zhong Xiao; José António Carvalho Paixão; Quan Jie Jia

doi:10.4028/www.scientific.net/MSF.663-665.1205

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HomeMaterials Science ForumMaterials Science Forum Vols. 663-665Study on the Evolution of Surface Morphology of...

Study on the Evolution of Surface Morphology of Hetero-Epitaxy Growth of ZnO Thin Film

Abstract:

Nano-granular ZnO thin films were deposited on Si (100) by molecular beam epitaxy (MBE) by varying growth time. The atomic force microscopy (AFM) and Raman scattering experiments were performed to study the surface morphology and vibrational properties of ZnO layer. The results show that the ZnO thin film grows in the Stranski-Kranstanow (SK) mode, and the critical thickness in our experimental condition is between 5.5 and 8.2 nm.

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Materials Science Forum (Volumes 663-665)

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1205-1208

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https://doi.org/10.4028/www.scientific.net/MSF.663-665.1205

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Online since:

November 2010

Authors:

Jing Zhong Xiao, José António Carvalho Paixão, Quan Jie Jia

Keywords:

Growth, Molecular Beam Epitaxy, Morpholoy, ZnO Thin Film

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