Effect of Sputtering Process Conditions on Microstructure and Mechanical Properties of Pt-Fe Nano Film

S. Ishiguro; R. Ogatsu; T. Inami; T. Nakano; Dong Ying Ju; N. Abe; K. Ishigawa

doi:10.4028/www.scientific.net/MSF.675-677.655

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HomeMaterials Science ForumMaterials Science Forum Vols. 675-677Effect of Sputtering Process Conditions on...

Effect of Sputtering Process Conditions on Microstructure and Mechanical Properties of Pt-Fe Nano Film

Abstract:

One of the vertical magnetic recordings medium materials of the hard disk drive (HDD) is a Pt-Fe thin film. The development of ultra-high density magnetic recording medium in next generation is expected the magnetic disks such as HDD with capacity enlargement of the data. In order to study effectiveness of the proposed sputtering method, we evaluated micro structure, magnetic and the mechanical properties of a Pt-Fe thin film by some sputtering process conditions. From research results, effect sputtering conditions on micro-structure and mechanical properties of Pt-Fe nano film are verified.

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Periodical:

Materials Science Forum (Volumes 675-677)

Pages:

655-658

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.675-677.655

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Online since:

February 2011

Authors:

S. Ishiguro, R. Ogatsu, T. Inami, T. Nakano, Dong Ying Ju, N. Abe, K. Ishigawa

Keywords:

Pt-Fe, Sputtering, Storage Media, Thin Film

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References

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