Inspection of the TFT Devices Using the Low-Energy Electron Beam Emitted from the Microcolumn

Tae Sik Oh; Seung Joon Ahn; Seong Joon Ahn; Dae Wook Kim; Ho Seob Kim

doi:10.4028/www.scientific.net/MSF.724.435

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HomeMaterials Science ForumMaterials Science Forum Vol. 724Inspection of the TFT Devices Using the Low-Energy...

Inspection of the TFT Devices Using the Low-Energy Electron Beam Emitted from the Microcolumn

Abstract:

The inspection of the TFT device for the LCD panel has been usually carried out by the large-scale electron column where the kinetic energy of the electron beam is higher than 10 kV, which has many disadvantages for the inspection. In this work, we replaced the bulky electron column with a tiny microcolumn and carried out the inspection of the TFT device. The result shows that the low-energy e-beam inspection can clearly observe the physical defects of the devices and also identify the abnormal electrical behavior caused by the defects in the device.

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Periodical:

Materials Science Forum (Volume 724)

Pages:

435-438

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.724.435

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Online since:

June 2012

Authors:

Tae Sik Oh, Seung Joon Ahn, Seong Joon Ahn, Dae Wook Kim, Ho Seob Kim

Keywords:

Inspection, LCD Panel, Low-Energy Electron Beam, Microcolumn, TFT Devices

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References

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