The Influence of Bi Content on the Properties of Bismuth Ferrite Thin Films Fabricated by Magnetron Sputtering

Abstract:

In the process of BiFeO₃ film preparation by magnetron sputtering, Bi element is volatile, leading to the films which often appear impurity phases. Therefore, Both Bi excessive 5% (B_1.05FO) and 8% (B_1.08FO) BFO film in Si substrate were prepared by magnetron sputtering. X-Ray Diffraction (XRD) results showed that the BFO thin films fabricated in the Si substrate are perovskite structure, that the B_1.08FO film appeared less impurity phases than B_1.05FO film, and that stress due to substrate lattice mismatch caused the shift of XRD patterns. In Raman study, it was concluded that both B_1.08FO film and B_1.05FO film appeared ten Raman peaks in the range from 50cm^-1 to 800cm^-1, and that B_1.08FO Raman peaks intensity was stronger in 137.1cm^-1.168.5cm^-1 and 215.3cm^-1. Spectroscopic ellipsometry test showed that the refractive index and the extinction coefficient of B_1.05FO film were 2.25 and 0.07 respectively in 600 nm with 2.67eV of energy gap; the refractive index and the extinction coefficient of B_1.08FO film were 2.14 and 0.05 in 600 nm respectively with 2.71eV of energy gap. Atomic Force Microscope (AFM) was used to characterize the film surface morphology, finding that the B_1.08FO film prepared in Si substrate was denser while grain size and surface roughness were smaller.

• Periodical: Materials Science Forum (Volumes 745-746)
• Pages: 131-135
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.745-746.131
• Online since: February 2013
• Authors: Hu Rui Yan, Nuo Fan Ding, Gang Wu, Ping Xiong Yang, Jun Hao Chu, Hong Mei Deng
• Keywords: BiFeO₃ Films, Magnetron Sputtering, Optical Property, Structural Characterization

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