Research on Preparation Technology of High Quality Diamond Film

Abstract:

The diamond films deposition experiment is carried out with MPCVD system. Some technology problems are discussed respectively, such as the substrate pretreatment, gases source compositions and deposition temperature. XRD pictures with different peaks illustrated that diamond film has good crystal orientation. A density of film crystal is observed and a thickness uniformity in detected by Scanning Electron Microscopy (SEM). The pureness of the diamond film was measured by Raman spectroscopy. The parameter coincidence rate is 90% based on the 10 prepared samples

• Periodical: Materials Science Forum (Volume 749)
• Pages: 392-400
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.749.392
• Online since: March 2013
• Authors: Chang Geng Zhou, Rui Qiu, Jian Lin Ke, Cai Lin Liu, Bing Wang
• Keywords: Control, Diamond Film, High Quality, Microwave Measurement, MPCVD

References

[1] Funer M, Wild C, Koidl P. Numerical simulation of microwave plasma reactors for diamond CVD, J. Surface and coatings technology, 74–75(1995)221–226.

DOI: 10.1016/0257-8972(95)08232-8

[2] Funer M, Wild C, Koidl P. Simulation and development of optimized microwave plasma reactors for diamond deposition, J. Surface and Coatings Technology, 116-119(1999)853–862.

DOI: 10.1016/s0257-8972(99)00233-9

[3] Funer M, Wild C, Koidl P. Novel microwave plasma reactor for diamond synthesis, J. Applied Physics Letters, 10(1998)1149–1151.

DOI: 10.1063/1.120997

[4] Pleuler E, Wild C, Funer M, et al. The CAP-reactor, a novel microwave CVD system for diamond deposition, J, Diamond and Related Materials, 11(2002)467–471.

DOI: 10.1016/s0925-9635(01)00731-2

[5] Yamada H, Chayahara A, Mokuno Y, et al. Analysis of power absorption and gas pressure dependence of microwave plasma using a tractable plasma description, J. Diamond & Related Materials, 15(2006)1395–1399.

DOI: 10.1016/j.diamond.2005.10.017

[6] Omvopoulos K K. Transmission electron microscopy study of diamond nucleation and growth on smooth silicon surfaces coated with a thin amorphous carbon film, J . Diamond and related materials, 9(2000)274 – 282.

DOI: 10.1016/s0925-9635(99)00296-4

[7] SHARADA T，RAHAMAN M M，NUKAYS Y，et al. Structural and optical properties of diamond and nano-diamond films grown by microwave plasma chemical vapor deposition, J. Diamond and Related Materials, 10 (2001)561－567.

DOI: 10.1016/s0925-9635(00)00390-3

[8] YANG Q , YANG SL , XIAO C，et al. Effects of nickel thin films on nucleation and growth of diamond on silicon substrates, J. Materials Research Innovations, 10(2006)408-411.

DOI: 10.1179/143307507x199380

[9] Pradhan D, Lee Y C , Pao C W, et al. Low temperature growth of ult rananocrystalline diamond film and its field emission properties, J. Diamond Relat Mater, 15(12006)(2001).

DOI: 10.1016/j.diamond.2006.07.026

[10] Mokuno Y, Chayahara A, Yamada H. Synthesis of large single crystal diamond plates by high rate homoepitaxial growth using microwave plasma CVD and lift-off process, J. Diamond & Related Materials, 17(2008)415-418.

DOI: 10.1016/j.diamond.2007.12.058

[11] VORLICEK V, ROSA J, VANECEK M, et al. Quantitative study of Raman scattering and defect optical absorption in CVD diamond films, J. Diam Rel Mater, 6(1997) 704-707.

DOI: 10.1016/s0925-9635(96)00630-9