The Effect of Working Pressure on the Composition and Optical Properties of TiO2 Films Bombarded by N Ion Beams

Ting Ting Yao; Hong Lin Liu; Wan Yu Ding; Dong Ying Ju; Wei Ping Chai

doi:10.4028/www.scientific.net/MSF.750.302

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HomeMaterials Science ForumMaterials Science Forum Vol. 750The Effect of Working Pressure on the Composition...

The Effect of Working Pressure on the Composition and Optical Properties of TiO₂ Films Bombarded by N Ion Beams

Abstract:

N-doped TiO2 films were prepared by using N ion beams to bombard TiO2 films surface. By controlling the metal ultrahigh vacuum gat valve, only the N ion beams working pressure was adjusted from 0.1 to 0.9 Pa, with the step size of 0.2 Pa. The composition, chemical bond structure, and optical properties of N-doped TiO2 films were investigated. The result indicated that with increasing the ion source working pressure, more N ions were generated and bombarded with the surface TiO2 films, which could result in more N ions were doped into the films. So with increasing the ion source working pressure from 0.1 to 0.9 Pa, the N/Ti and O/Ti atom ratio increased and decreased monotonously from 0.37 to 0.49 and 1.49 to 0.61, respectively. Meanwhile, because of more N doped into films, the mean absorbency of N doped TiO2 films in the visible range also increased monotonously from 4.8% to 45.8%.

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Periodical:

Materials Science Forum (Volume 750)

Pages:

302-305

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.750.302

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Online since:

March 2013

Authors:

Ting Ting Yao, Hong Lin Liu, Wan Yu Ding, Dong Ying Ju, Wei Ping Chai

Keywords:

Ion Source, N Doped TiO₂, Optical Property, XPS

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