Oxidation of Tantalum Nitride

Kazuya Hamaguchi; Tomoyuki Tsuchiyama; Junichi Matsushita

doi:10.4028/www.scientific.net/MSF.761.125

Paper Titles

Linear Assembly of Oxidized Surface Treated Nanodiamonds in Polymer-Based Nanohybrids by Electric Field Inducement
p.107

Characterization of HA/Ta Composite Coatings Fabricated by Vacuum Plasma Spraying
p.113

Responses of Human Bone Marrow-Derived Stromal Cells to Calcium Silicate Coatings with Different Chemical Stability
p.117

Preparation of Copper Nanoparticles by Pulsed Wire Discharge in Water
p.121

Oxidation of Tantalum Nitride
p.125

Fabrication of Nanorod Array Structure by Using Aluminizing and Internal Oxidation of Ni with Micro-Channels
p.131

Characterization of Hydroxyapatite Containing of Titanium Hydride Sintered Body by Nano Size Powder
p.135

Characterization and Cell Response of Novel Hydroxyapatite/Glyceride-Based Polyurethane Porous Scaffold
p.141

Synthesis of Palladium Nanoparticles in Various Carbon Materials
p.147

HomeMaterials Science ForumMaterials Science Forum Vol. 761Oxidation of Tantalum Nitride

Oxidation of Tantalum Nitride

Abstract:

Tantalum (Ta) can be use a suture for operation and implant material in order not to react with body fluid and stimulate a human body. In this study, the stable oxide of a tantalum, tantalum oxide layer produced by oxidation of the tantalum nitride, TaN powders by high temperature oxidation were investigated in order to determine the possibility of its a distributed aid for biomaterial composite such as an artificial root etc. The sample, TaN powder oxidized at high temperature exhibited a steady mass gain with increasing oxidation temperature. Based on the results of the XRD, tantalum oxide, Ta2O5 was detected on the samples. It is considered, the TaN showed a good oxidation film produced by high temperature oxidation.