Research on the Raman Spectrum of the MPCVD Diamond Films

Wen Jing Wang; Xing Yuan Li; Hong Mei Zhang; Xi Feng Ding; Xin Sun

doi:10.4028/www.scientific.net/MSF.852.1006

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HomeMaterials Science ForumMaterials Science Forum Vol. 852Research on the Raman Spectrum of the MPCVD...

Research on the Raman Spectrum of the MPCVD Diamond Films

Abstract:

This research took CH₄ and H₂ as the air source and sufficiently utilized the diamond films generated on the Si piece due to the microwave plasma chemical vapor deposition (MPCVD) method. Raman spectrum functioned as the key method to investigate the diamond films in such research. The diamond phase, large graphite monocrystals and the disorderly graphite in the films were related respectively to different Raman characteristic peaks. An analysis and related investigation on the Raman spectrum of the sample revealed the performance parameters of the structure, purity and stress of the diamond films in different concentrations of the air source.

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Periodical:

Materials Science Forum (Volume 852)

Pages:

1006-1009

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.852.1006

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Online since:

April 2016

Authors:

Wen Jing Wang, Xing Yuan Li, Hong Mei Zhang, Xi Feng Ding, Xin Sun

Keywords:

Diamond (Film), Methane Concentration, MPCVD, Raman Spectrum

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