Defect Engineering in Self-Assembled 3D Photonic Crystals

Abstract:

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This work describes the combination of photolithography and self-assembly methods for fabrication of 3D photonic crystals (PCs) with well-defined micron-scale line defects embedded in the PCs. Line defects with different dimensions, shapes, and compositions have been introduced into the 3D PCs by choosing different photoresists, masks, and template-directed assembly techniques. Infiltration of carbon using high-temperature chemical vapor deposition (CVD) technique showed that the fabrication procedure offers an ideal approach to functional 3D photonic devices from self-assembled photonic crystals.

Info:

Periodical:

Solid State Phenomena (Volumes 121-123)

Edited by:

Chunli BAI, Sishen XIE, Xing ZHU

Pages:

377-380

DOI:

10.4028/www.scientific.net/SSP.121-123.377

Citation:

Q. F. Yan et al., "Defect Engineering in Self-Assembled 3D Photonic Crystals", Solid State Phenomena, Vols. 121-123, pp. 377-380, 2007

Online since:

March 2007

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Price:

$35.00

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