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HomeSolid State PhenomenaSolid State Phenomena Vols. 121-123Characteristics of Low Lasing Threshold Zn1-xMgxO...

Characteristics of Low Lasing Threshold Zn1-xMgxO Films Grown by RF Magnetron Sputtering

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Periodical:

Solid State Phenomena (Volumes 121-123)

Pages:

487-490

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.121-123.487

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Online since:

March 2007

Authors:

Xiao Liang Xu, Liao Yuan Wang, Li Feng Yan, Ming Tao Yang, Chao Shu Shi

Keywords:

Lasing Threshold, Photoluminescence (PL), ZnMgO

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© 2007 Trans Tech Publications Ltd. All Rights Reserved

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[14] X.L.Xu and C.S. Shi, Chin. Prog. in Physics 20(4), 356(2000) Fig.4. AFM image of Zn0.84Mg0.16O films annealed at (a) as-grown, (b)550 oC and (c) 750 o C.