Characterization of Solid Tin Target for Gas Discharges Produced EUV Plasmas

C.H. Zhang; S. Katsuki; J.G. Shi; H. Horita; T. Namihira; H. Akiyama

doi:10.4028/www.scientific.net/SSP.121-123.885

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HomeSolid State PhenomenaSolid State Phenomena Vols. 121-123Characterization of Solid Tin Target for Gas...

Characterization of Solid Tin Target for Gas Discharges Produced EUV Plasmas

Abstract:

In the development of our Z-pinch plasma EUV source, xenon (Xe) is used for the background gas discharges, and a solid tin (Sn) rod is used as target material due to its potential of high convention efficiency (CE) from input electric energy to EUV radiation [1, 2]. The Z-pinch plasma was driven by pulsed current with amplitude of 30 kA and pulse duration of 110 ns. Pinhole imaging, EUV spectrograph and in-band EUV energy monitor were used to characterize the EUV emission from the Z-pinch discharge. The experimental analyses have demonstrated the CE was as high as 3% [3].

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Periodical:

Solid State Phenomena (Volumes 121-123)

Pages:

885-888

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.121-123.885

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Online since:

March 2007

Authors:

C.H. Zhang, S. Katsuki, J.G. Shi, H. Horita, T. Namihira, H. Akiyama

Keywords:

Capillary Discharge, EUV Sources, TiN Plasma, Xenon Emissions, Z-Pinch

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