Development of Large Area Plasma Reactor Using Multiple Low-Inductance Antenna Modules for Flat Panel Display Processing

Abstract:

This article reports characteristics of plasmas sustained with LIA modules and profile control capabilities. Experiments with a meter-scale reactor demonstrated uniform plasma production to attain densities as high as 5x1011 cm-3 at an argon pressure of 1.3 Pa and an RF power of 4 kW. Design issues for large-area plasma sources with a scale-size of 3 m were also presented to exhibit the feasibility of novel large-area plasma sources to meet the requirements of the next-generation meters-scale processing.

• Periodical: Solid State Phenomena (Volume 127)
• Pages: 239-244
• DOI: https://doi.org/10.4028/www.scientific.net/SSP.127.239
• Online since: September 2007
• Authors: Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe, Kazuaki Nishisaka
• Keywords: Flat-Panel Display, High Density Plasma, Large Area Plasma, Low Inductance Antenna

References

[1] M. A. Lieberman and A. J. Lichtenberg: Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).

[2] A. A. Howling, J. L. Dorier, C. Hollenstein and U. Kroll, J. Vac. Sci. Technol. A Vol. 10 (1992), p.1080.

[3] V. Vahedi V, C. K. Birdsall, M .A. Lieberman, G. DiPeso and T. D. Rognlien, Phys. Fluids B Vol. 5 (1993), p.2719.

[4] J. Hopwood, Plasma Sources Sci. Tehcnol. Vol. 1 (1992), p.109.

[5] P. L. G. Ventzek, R. J. Hoekstra, and M. J. Kushner, J. Vac. Sci. Technol. A Vol. 12 (1994), p.461.

[6] L. J. Mahoney, A. E. Wendt, E. Barrios, C. J. Richards, and J. L. Shohet, J. Appl. Phys. Vol. 76 (1994), p. (2041).

[7] R. A. Stewart, P. Vitello and D. B. Graves, J. Vac. Sci. Technol. B Vol. 12 (1994), p.478.

[8] Y. Setsuhara, S. Miyake, Y. Sakawa and T. Shoji, Jpn. J. Appl. Phys. Vol. 38 (1999), p.4263.

[9] S. -H. Seo, C.W. Chung, H. -Y. Chang, Surf. Coat. Technol. Vol. 131 (2000), p.1.

[10] Y. Setsuhara, S. Miyake, Y. Sakawa and T. Shoji, Surf. Coat. Technol. Vol. 136 (2001), p.60.

[11] M. Moisan, C. Baudry and P. Leprince, IEEE Trans. Plasma Sci. Vol. PS-3 (1975), p.1004.

[12] M. Moisan, A. Shivarova and A.W. Trivelpiece, Plasma Phys. Vol. 24 (1982), p.1331.

[13] M. Nagatsu, G. Xu, M. Yamage, M. Kanoh and H. Sugai, Japan. J. Appl. Phys. Vol. 35 (1996), p. L341.

[14] I. Odrobina, J. Kudera and M. Kando, Plasma Sources Sci. Technol. Vol. 7 (1998), p.238.

[15] J. Perrin, J. Schmitt, C. Hollenstein, A. Howling and L. Sansonnens, Plasma Phys. Control. Fusion Vol. 42 (2000), p. B353.

DOI: 10.1088/0741-3335/42/12b/326

[16] Y. Wu and M. A. Lieberman, Plasma Sources Sci. Technol. Vol. 9 (2000), p.210.

[17] M. H. Khater and L. J. Overzet, Plasma Sources Sci. Technol. Vol. 9 (2000), p.545.

[18] Y. Setsuhara, T. Shoji, A. Ebe, S. Baba, N. Yamamoto, K. Takahashi, K. Ono and S. Miyake, Surf. Coatings. Tehcnol. Vol. 174-175 (2003), p.33.

DOI: 10.1016/s0257-8972(03)00523-1

[19] T. Shoji, Y. Sakawa, S. Nakazawa, K. Kadota and T. Sato, Plasma Sources Sci. Technol. Vol. 2 (1993), p.5.

[20] J. Q. Zhang, Y. Setsuhara, T. Ariyasu and S. Miyake, J. Vac. Sci. Technol. A Vol. 14 (1996), p.2163.

[21] M. Tuszewski, J. T. Scheuer and R. A. Adler, Surf. Coat. Technol. Vol. 93 (1997), p.203.

[22] A. V. Vasenkov and M. J. Kushner: Phys. Rev. E. Vol. 66 (2002), p.411.