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Electrical Property of TiO2 Thin Film Deposited by RF Sputtering

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Abstract:

The authors investigated on the electrical property and the photo-catalytic activity of TiO2 thin films deposited in Ar+O2 atmosphere by RF magnetron sputtering. From the result of x-ray diffraction, the anatase phase was formed in TiO2 thin films. In TiO2 thin film deposited under a gas pressure of 3.0Pa, the contact angle of water showed 9 ﾟ, and the decomposition rate of Methylene Blue (measuring the absorbance of the reference light) showed -0.067 with UV light irradiation. Moreover, it revealed that the electric resistivity of TiO2 thin film deposited under the same conditions decreased from 8.0×103Ω･m to 1.4×10-2Ω･m with UV light irradiation.

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Periodical:

Solid State Phenomena (Volume 127)

Pages:

221-226

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.127.221

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Online since:

September 2007

Authors:

Kiyozumi Niizuma, Takahiro Hayakawa, Yoshio Utsushikawa

Keywords:

Electrical Properties, Photocatalytic Activity, Thin Film, Titania (TiO2)

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© 2007 Trans Tech Publications Ltd. All Rights Reserved

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