Microscopic Analysis of Track Etched Polymeric Membranes

Abstract:

The bombardment of energetic ions on polymer membranes will produce the loosely bound passage in the membrane structure due to the energy loss. The Swift Heavy Ions (SHI) creates the latent tracks of several nm surrounded by several tens of nm track halo. The tracks can be visualized under Atomic Force Microscope after wet chemical etching. In present study the polymeric membranes of 30 μm was prepared by solution cast method and irradiated by 60 MeV C+5 energetic ions. The electronic energy losses are predominant at high energies. The membranes were etched chemically to convert the tracks in to suitable pores. The Atomic Force Microscopy (AFM) gives the size and distribution of the pores. The pore size is observed in nano regime. The pore density was found to depend on the irradiation dose.

• Periodical: Solid State Phenomena (Volume 155)
• Pages: 107-112
• DOI: https://doi.org/10.4028/www.scientific.net/SSP.155.107
• Online since: May 2009
• Authors: N.K. Acharya
• Keywords: Atomic Force Microscope (AFM), Polymer, Swift Heavy Ions

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