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A Model for Formation and Consumption of Transient Phase

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Abstract:

The phase formation sequence of Ni silicide for different thicknesses is studied by in situ X ray diffraction and differential scanning calorimetry measurements. The formation of a transient phase is observed during the formation of δ-Ni2Si; transient phases grow and disappear during the growth of another phase. A possible mechanism is proposed for the transient phase formation and consumption. It is applied to the growth and consumption of θ-Ni2Si. A good accordance is found between the proposed model and in situ measurement of the kinetics of phase formation obtained by x-ray diffraction and differential scanning calorimetry for higher thickness.

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Periodical:

Solid State Phenomena (Volumes 172-174)

Pages:

646-651

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.172-174.646

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Online since:

June 2011

Authors:

Gamra Tellouche, Khalid Hoummada, Dominique Mangelinck, Ivan Blum

Keywords:

Differential Scanning Calorimetry (DSC), Model, Ni-Silicide, Transient Phase, X-Ray Diffraction (XRD)

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© 2011 Trans Tech Publications Ltd. All Rights Reserved

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