A Model for Formation and Consumption of Transient Phase

Abstract:

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The phase formation sequence of Ni silicide for different thicknesses is studied by in situ X ray diffraction and differential scanning calorimetry measurements. The formation of a transient phase is observed during the formation of δ-Ni2Si; transient phases grow and disappear during the growth of another phase. A possible mechanism is proposed for the transient phase formation and consumption. It is applied to the growth and consumption of θ-Ni2Si. A good accordance is found between the proposed model and in situ measurement of the kinetics of phase formation obtained by x-ray diffraction and differential scanning calorimetry for higher thickness.

Info:

Periodical:

Solid State Phenomena (Volumes 172-174)

Edited by:

Yves Bréchet, Emmanuel Clouet, Alexis Deschamps, Alphonse Finel and Frédéric Soisson

Pages:

646-651

DOI:

10.4028/www.scientific.net/SSP.172-174.646

Citation:

G. Tellouche et al., "A Model for Formation and Consumption of Transient Phase", Solid State Phenomena, Vols. 172-174, pp. 646-651, 2011

Online since:

June 2011

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Price:

$35.00

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