The Influence of the Angle of Incidence in Megasonic Cleaning

Article Preview

Abstract:

The megasonic cleaning efficiency is evaluated as a function of the angle of incidence of acoustic waves on a Si wafer. Acoustic Schlichting streaming alone is not able to remove nanoparticles smaller than 400 nm. It is shown that oscillating or collapsing behavior of bubbles are responsible for removing nanoparticles smaller than 400 nm during a cleaning process with ultrasound. Optimal particle removal efficiency is obtained around the angle of acoustic transmission of the silicon wafer.

You might also be interested in these eBooks

Info:

Periodical:

Solid State Phenomena (Volume 187)

Pages:

163-166

Citation:

Online since:

April 2012

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2012 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] P. Mertens, J. Acoust. Soc. Am. 123 (2008), p.3045.

Google Scholar

[2] F. Holsteyns, A. Riskin, G. Vereecke, A. Maes and P.W. Mertens, ECS Proc. 26 (2003), p.161.

Google Scholar

[3] P.A. Deymier, J.O. Vasseur, A. Khelif, B. Djafari-Rouhani, L. Dobrzynski and S. Raghavan, J. Appl. Phys. 88 (2000), p.6821.

DOI: 10.1063/1.1323521

Google Scholar

[4] M. Zang, D.B. Kittelson, T.H. Kuehn and R. Gouk, IEEE Ultras. Symp. (1997), p.833.

Google Scholar

[5] K. Xu, R. Vos, G. Vereecke, M. Lux, W. Fyen, F. Holsteyns, K. Kenis, P. Mertens, M. Heyns and C. Vinckier, Solid State Phenom. 92 (2003), p.161.

DOI: 10.4028/www.scientific.net/ssp.92.161

Google Scholar

[6] T.G. Leighton, The Acoustic Bubble (Academic Press Inc., USA, 1994).

Google Scholar