Control of Sonoluminescence in Carbon Dioxide Containing Di Water at near Neutral pH Conditions

Abstract:

Light emission in sound-irradiated liquids, known as Sonoluminescence (SL), is associated with the phenomenon of cavitation that affects wafer damage during megasonic processing of wafers. It has been shown that the intensity of SL can be substantially decreased through the dissolution of carbon dioxide in deionized water. However, such dissolution decreases the pH to roughly 4.0, which is not very desirable for the removal of contaminant particles. This paper reports two chemical systems that are capable of taking advantage of the effect of CO₂ while allowing the use of slightly higher pH values. Specifically, NH₄OH/CO₂ and NH₄HCO₃/dilute HCl systems have been shown to be capable of well controlled reduction in SL at pH 5.7 or 7.0. In order to test whether the free radical scavenging ability of CO₂ may be responsible for its strong SL-inhibitory effect, the effect of a well known free radical scavenger, dimethyl sulfoxide (DMSO), on SL produced in DI water has been investigated.

• Periodical: Solid State Phenomena (Volume 187)
• Pages: 177-180
• DOI: https://doi.org/10.4028/www.scientific.net/SSP.187.177
• Online since: April 2012
• Authors: Sangita Kumari, Manish Keswani, Satish Kumar Singh, Mark Beck, Eric Liebscher, Pierre Deymier, Srini Raghavan
• Keywords: Carbon Dioxide, Damage, Megasonic Cleaning, Sonoluminescence

References

[1] Gale GW and Busnaina AA (1999) Particul Sci Technol 17, pp.229-238.

[2] Kapila V, Deymier PA, Shende H, Pandit V, Raghavan S and Eschbach FO (2006) Proc SPIE-Int Soc Opt Eng 6283, p.628324/1-12.

[3] De Marco C, Wostyn KL, Bearda T, Sano K-I, Kenis K, Janssens T, Leunissen LHA, Eitoku A and Mertens P (2007) ECS Transactions 11, pp.87-93.

DOI: 10.1149/1.2779366

[4] Vereecke G, Holsteyns F, Arnauts S, Beckx S, Jaenen P, Kenis K, Lismont M, Lux M, Vos R, Snow J, et al. (2005), eds. Mertens P, Meuris M and Heyns M, 103-104, pp.141-146.

DOI: 10.4028/www.scientific.net/ssp.103-104.141

[5] Negishi K (1961) J Phys Soc Jpn 16, pp.1450-1465.

[6] Muralidharan K, Keswani M, Shende H, Deymier P, Raghavan S, Eschbach F and Sengupta A (2007) in Emerging Lithographic Technologies XI (SPIE, San Jose, CA, USA), 6517, pp. 65171E/1-13.

DOI: 10.1117/12.712464

[7] Helbig S, Urban S, Klein E and Singh S (2008) in Photomask Technology 2008 (SPIE, Monterey, CA, USA), 7122, p.712210/1-10.

[8] Kumari S, Keswani M, Singh SK, Liebscher E, Beck M, Deymier P and Raghavan S (2010) Accepted for Publication in Microelec Eng.

[9] Klein SM, Cohen G and Cederbaum AI (1981) Biochemistry-US 20, pp.6006-6012.

[10] Kondo T, Kirschenbaum LJ, Kim H and Riesz P (1993) J Phys Chem-US 97, pp.522-527.

[11] Kumari S, Keswani M, Beck M, Liebscher E, Liang T, Deymier P and Raghavan S (2009) ECS Transactions 25, pp.295-302.

DOI: 10.1149/1.3202666

[12] Buxton GV, Greenstock CL, Helman WP and Ross AB (1988) J Phys Chem Ref Data 17, pp.513-886.