Multitarget Sputtering of Piezoelectric Mixed Oxide Thin Films onto Flexible Substrates

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Abstract:

Large area film deposition was performed by means of multitarget reactive magnetron sputtering from metallic targets (Pb, Ti, Zr) with a diameter of 200 mm onto Cu-coated Kapton® HN substrates. High-power pulse sputtering has been employed for the Zr-target (or alternatively for the Ti-target). Film composition profiles were evaluated by XPS and RBS. Piezoelectric properties were investigated by PFM.

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