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Dose Characteristics of Multilayer Chitosan-Metal-Dielectric Nanostructures for Electronic Nanolithography

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Abstract:

This paper presents the results of the study of chitosan-metal nanofilms for the formation of submicron structures on glass substrates by electron lithography. The dependence of their basic lithographic characteristics from the selection of the metal for intermediate layer is obtained.

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Periodical:

Solid State Phenomena (Volume 245)

Pages:

195-199

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.245.195

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Online since:

October 2015

Authors:

Sergey S. Voznesenskiy*, Aleksandr Nepomnyaschiy

Keywords:

Chitosan-Metal Nanofilms, Electron Lithography, Lithographic Characteristics, Submicron Structures

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© 2016 Trans Tech Publications Ltd. All Rights Reserved

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