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HomeSolid State PhenomenaSolid State Phenomena Vols. 67-68Ion Assisted Reactive Magnetron Sputtering as a...

Ion Assisted Reactive Magnetron Sputtering as a Deposition Method for High Quality Thin Films of Compound Semiconductors

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Polycrystalline Semiconductors V

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Periodical:

Solid State Phenomena (Volumes 67-68)

Pages:

261-268

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.67-68.261

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Online since:

April 1999

Authors:

K. Ellmer

Keywords:

Compound Semiconductor, Reactive Magnetron Sputtering, Solar Cell

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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