Ion Assisted Reactive Magnetron Sputtering as a Deposition Method for High Quality Thin Films of Compound Semiconductors

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Periodical:

Solid State Phenomena (Volumes 67-68)

Edited by:

J.H. Werner, H.P. Strunk, H.W. Schock

Pages:

261-268

DOI:

10.4028/www.scientific.net/SSP.67-68.261

Citation:

K. Ellmer "Ion Assisted Reactive Magnetron Sputtering as a Deposition Method for High Quality Thin Films of Compound Semiconductors", Solid State Phenomena, Vols. 67-68, pp. 261-268, 1999

Online since:

April 1999

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