Behavior of Hydrogen in Al, Mg and MgAl Plasma Saturated Films

Darius Milčius; L.L. Pranevičius; Jurgita Nomgaudytė; Irmantas Barnackas

doi:10.4028/www.scientific.net/SSP.97-98.159

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Formation and Characteristics of Thin Films of ZrO₂-8 mol % Y₂O₃ Solid Electrolytes
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Behavior of Hydrogen in Al, Mg and MgAl Plasma Saturated Films
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Self Formation of Porous Silicon Structure: Primary Microscopic Mechanism of Pore Separation
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The Role of Processes on the Surface in Organization of Long Range Mass-Transport in the Bulk
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HomeSolid State PhenomenaSolid State Phenomena Vols. 97-98Behavior of Hydrogen in Al, Mg and MgAl Plasma...

Behavior of Hydrogen in Al, Mg and MgAl Plasma Saturated Films

Abstract:

The behaviors of hydrogen in Al, Mg and MgAl thin films on stainless steel substrate were investigated in this work. The hydrogen ions extracted from plasma were used to load hydrogen into the film material. Glow discharge optical emission spectroscopy (GDOES) was applied to obtain the hydrogen depth profiles in Al films versus hydriding parameters. The MgH2, AlH3 and Mg(AlH4)2 hydrides were identified in plasma hydrided films using X-ray diffraction (XRD). It is shown that efficient supply transport of hydrogen from the surface into the bulk for Mg films takes place at temperature above 100 °C and ion irradiation intensity above 1 mAcm-2.