Behavior of Hydrogen in Al, Mg and MgAl Plasma Saturated Films

Abstract:

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The behaviors of hydrogen in Al, Mg and MgAl thin films on stainless steel substrate were investigated in this work. The hydrogen ions extracted from plasma were used to load hydrogen into the film material. Glow discharge optical emission spectroscopy (GDOES) was applied to obtain the hydrogen depth profiles in Al films versus hydriding parameters. The MgH2, AlH3 and Mg(AlH4)2 hydrides were identified in plasma hydrided films using X-ray diffraction (XRD). It is shown that efficient supply transport of hydrogen from the surface into the bulk for Mg films takes place at temperature above 100 °C and ion irradiation intensity above 1 mAcm-2.

Info:

Periodical:

Solid State Phenomena (Volumes 97-98)

Edited by:

Stepas Janušonis

Pages:

159-164

DOI:

10.4028/www.scientific.net/SSP.97-98.159

Citation:

D. Milčius et al., "Behavior of Hydrogen in Al, Mg and MgAl Plasma Saturated Films", Solid State Phenomena, Vols. 97-98, pp. 159-164, 2004

Online since:

April 2004

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Price:

$35.00

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