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References [1] Ness J E V, Brash F M, Landgren G L et al, Analytic investigation of dynamic instability occurring at power station.
EL-726, Apr. 1978.

serial constraint chains DOF Joint's arrangement patterns 2 RR(T), RP(C), PP 3 RRR(S), RRP, RPP, PPP, TR, TP, RC, CP 4 RRRP, RRPP, RPPP, SP, RRC, TRP, TC, TPP, RCP, CPP 5 RRRPP, RRPPP, SPP, TCP, TRPP, PRPT, RCPP, TPPP, CRU, TPC Mixed Constraint Chains of Serial and Parallel Table 4 Classification of mixed constraint chains of serial and parallel monolayer chain combined with pair P combined with pair R double layer chain combined with pair P combined with pair R U^ PU^ RU^ U^U^ PU^U^ RU^U^ U P PU P RU P U P U P PU P U P RU P U P U*(3-TT,3-SS) PU* RU* U*U* PU*U* RU*U* 4R P4R R4R 4R4R P4R4R R4R4R 4T P4T R4T 4T4T P4T4T R4T4T 4S P4S R4S 4S4S P4S4S R4S4S Table 5 Some examples of regular mixed constraint chains DOF Type of limb chain Sketch Number of kinematical constraints Structure of limb chain Restricted movement Application 3 U*U*, PU*, PU p 3 The axes P parall- el
Guo and et al: Annals of the CIRP, Vol.48 (1999) No.1, pp.333.

Desalination Vol. 225 (2008), p.58-69 [3] Alaa El-Sadek: An imperative measure for water security in Egypt.
Al-Shammiri and M.

Fouilland et al. [6] have reported that the mechanical properties is closely related to the smoothness of the microstructure (dendrite size and spacing between dendrites), itself in direct relationship with the process of welding.
El Mansori, M.

[6] H.El-Shall, M.M.Rashard, E.A.Abdel-Aal.: Crystal.
Brockner: Zement-Kalk-Gips. 1990, (9): 219~220 [8] Manjit Singh and Mridul Garg: Cement and Concrete Research. 1997, 27 (6): 947~950 [9] Yuhe Deng，Jiayan Luo，Dexing Zai et al: Holzforschung, 2008, 62(3): 368-371 [10] N.Singh.: Journal of Thermal Analysis and Calorimetry, 2006, 86(3): 721-726 [11] M.H.H.

Mariucci, A.L.
Cano: El Método Rietveld, 1ra Ed.

Estimation of HSQ Resist Profile by Using High Contrast Developement Model for High Resolution EB Lithography Hui Zhang1, a, Takuya Komori1,b,Jing Liu1,c, Yulong Zhang1,d, Zulfakri Mohamad1,e, You Yin1,f, and Sumio Hosaka1,g 1Graduate School of Engineering, Gunma University, Japan at10802275@gunma-u.ac.jp,bt11801314@gunma-u.ac.jp,cchina-liujing@hotmail.com, dvera0922@163.com, ezulfakri@salam.uitm.edu.my,fyinyou@gunma-u.ac.jp, ghosaka@el.gunma-u.ac.jp Keywords: Hydrogen silsesquioxane (HSQ) resist, energy deposition distribution (EDD), exposure dosage (D), contrast, resist profile Abstract: We calculated the hydrogen silsesquioxane (HSQ) resist profiles with different contrast developers (γ from 1.9 to 8.1) to reveal the effect of resist contrast on pattern resolution performance.
Komori et al. showed that addition of NaCl into TMAH base solution for developing HSQ resist can significantly improve the contrast and resolution [2].

Tjong et al. [4] indicated that addition of only 5vol.% TiB2 particle to copper leads to a dramatic improvement in its wear resistance.
El-Badry, A.M.

Armitage, el.al...

Recently, Fujimoto et al. [16] proposed a new structural parameter, the ‘comprehensive crystallization index (CCI)’ which defines a measure of the graphitization degree.
[9] E.L.