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Design of Projection Lithography Objective Lens with Sub-Ten Micrometer Line-Width and its MTF Experimental Measurements

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Abstract:

Double fold reduction projection lithography objective lens with bi-telecentric configuration, consists of 6 lenses and the number aperture , is designed based on the optical design software Zemax. It uses the 405nm laser diode (LD) as light source. The spatial resolving capacity approaches to 5um. In a field of view of , its wave-front aberration is less than a quarter of wave-length and the distortion ratio is not more than. The imaging performance, in particular, the accurate modulation transfer function (MTF) value of the projection objective lens being fabricated by experiments is determined in this paper. Through analyzing the noise disturbance law in MTF tests, the result show that the projection objective lens has sub ten micrometer resolving ability.

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Periodical:

Advanced Materials Research (Volume 901)

Pages:

111-115

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.901.111

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Cite this paper

Online since:

February 2014

Authors:

Liang Lei*, Xin Liu, Lang Lin Li, Jin Yun Zhou

Keywords:

Lithography, MTF, Optical Transfer Function, Projection Objective Lens

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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