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Ultra Clean Processing of Semiconductor Surfaces VIII

Edited by: Dr. Paul W. Mertens, Marc Meuris and Marc Heyns

Online since: November 2007

Description: Volume is indexed by Thomson Reuters CPCI-S (WoS).
This collection of 86 peer-reviewed papers covers all aspects of the use of ultra-clean technology for large-scale integration on semiconductors, and cleaning and contamination-control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing.