Books by Keyword: Residue

Description: The proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98) cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP).

Description: The present volume is a collection of papers written by leading experts who are active in the pivotal roles played by chemists in the energy industry and its impact on society. Covered here are the areas of chemistry, physics, materials science, electrochemistry, energy research, electrical engineering and battery manufacture.