Engineering Research
Advanced Engineering Forum
Applied Mechanics and Materials
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Engineering Innovations
Journal of Biomimetics, Biomaterials and Biomedical Engineering
International Journal of Engineering Research in Africa
Materials Science
Advanced Materials Research
Defect and Diffusion Forum
Diffusion Foundations and Materials Applications
Journal of Metastable and Nanocrystalline Materials
Journal of Nano Research
Key Engineering Materials
Materials Science Forum
Nano Hybrids and Composites
Solid State Phenomena
Engineering Series
Advances in Science and Technology
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Engineering Headway
Books by Keyword: XPS
Books
Edited by:
Jiti Nukeaw and Wisanu Pecharapa
Online since: September 2013
Description: All the papers in this book have been subjected to a peer-review process based on their originality and quality. The topics covered in this book include materials for energy conversion, nanomaterials: synthesis and applications, environmental friendly materials, biomaterials, magnetic materials, electroceramic materials, materials processing, composite materials, functional materials, thin film technology, materials characterization and simulation, and materials technology and devices.
Volume is indexed by Thomson Reuters CPCI-S (WoS).
Volume is indexed by Thomson Reuters CPCI-S (WoS).
Edited by:
Norlida Kamarulzaman
Online since: July 2012
Description: Volume is indexed by Thomson Reuters CPCI-S (WoS).
The objective of this special collection is to provide a platform for the presentation of the latest progress achieved by materials scientists in divers fields: such as the latest techniques in materials synthesis, characterization and fabrication - plus the functionalities of materials and devices. The papers are grouped into: Nanomaterials and Nanostructures; Electrochemical Materials; Biology, Medical and Pharmaceutical Materials and Technology; Metals and Alloys; Electrical and Electronic Materials; Polymeric Materials and Composites; Devices (Including MEMS and NEMS); Catalytic Materials; Semiconducting and Superconducting Materials; Other Materials.
The objective of this special collection is to provide a platform for the presentation of the latest progress achieved by materials scientists in divers fields: such as the latest techniques in materials synthesis, characterization and fabrication - plus the functionalities of materials and devices. The papers are grouped into: Nanomaterials and Nanostructures; Electrochemical Materials; Biology, Medical and Pharmaceutical Materials and Technology; Metals and Alloys; Electrical and Electronic Materials; Polymeric Materials and Composites; Devices (Including MEMS and NEMS); Catalytic Materials; Semiconducting and Superconducting Materials; Other Materials.
Edited by:
Paul Mertens, Marc Meuris and Marc Heyns
Online since: April 2012
Description: The International Symposium on Ultra-Clean Processing of Semiconductor Surfaces (UCPSS) is a bi-annual conference which has been organized by IMEC since 1992.
Volume is indexed by Thomson Reuters CPCI-S (WoS).
The scope of the symposium includes all issues related to contamination, cleaning and surface preparation in mainstream large-scale Integrated Circuit manufacture. At first, silicon was typically the main semiconductor of interest. As other semiconducting materials such as SiGe, SiC, Ge and III-V compounds came under consideration for future devices, the scope was broadened so as to include these materials. Parallelling the fast-moving CMOS industry, the photovoltaic industry has also recognized the need to make improvements in cleaning. Moreover, in order to promote these semiconductor cleaning activities in PV, it was decided to add a special session focused on this topic.
Volume is indexed by Thomson Reuters CPCI-S (WoS).
The scope of the symposium includes all issues related to contamination, cleaning and surface preparation in mainstream large-scale Integrated Circuit manufacture. At first, silicon was typically the main semiconductor of interest. As other semiconducting materials such as SiGe, SiC, Ge and III-V compounds came under consideration for future devices, the scope was broadened so as to include these materials. Parallelling the fast-moving CMOS industry, the photovoltaic industry has also recognized the need to make improvements in cleaning. Moreover, in order to promote these semiconductor cleaning activities in PV, it was decided to add a special session focused on this topic.
Edited by:
R. K. Singhal
Online since: May 2011
Description: This special issue of “Solid State Phenomena” documents some novel experimental and theoretical approaches applied to fascinating materials. Motivated by the increasing need to synthesize and understand the properties of technologically important materials, this issue represents an important step forward in improving our understanding of how modern materials can be optimised for technology and industry. The issue comprises 9 original review papers covering experimental approaches and theoretical modeling. The contributions will be very useful to researchers working in various areas of CMP and will contribute significantly to the understanding of rapidly developing materials with regard to their synthesis, characterization and properties.
Edited by:
A. Agüero, J.M. Albella, M.P. Hierro, J. Phillibert and F.J. Pérez Trujillo
Online since: April 2009
Description: Diffusion is always central to many scientific and technological fields. From the recognition of Fick´s laws, up to the present day, there have been very important diffusion-based contributions made to fields such as biology, nanosciences, chemistry, physics, etc.
Volume is indexed by Thomson Reuters CPCI-S (WoS)
Volume is indexed by Thomson Reuters CPCI-S (WoS)
Edited by:
Paul Mertens, Marc Meuris and Marc Heyns
Online since: January 2009
Description: Volume is indexed by Thomson Reuters CPCI-S (WoS).
The contents of this publication include every conceivable issue related to contamination, cleaning and surface preparation during mainstream large-scale integrated circuit manufacture. Typically, silicon is used as the main semiconductor substrate. However, other semiconducting materials such as SiGe and SiC are currently being used in the source-sink junction areas, and materials such as Ge and III-V compounds are being considered for the transistor channel region of future-generation devices.
The contents of this publication include every conceivable issue related to contamination, cleaning and surface preparation during mainstream large-scale integrated circuit manufacture. Typically, silicon is used as the main semiconductor substrate. However, other semiconducting materials such as SiGe and SiC are currently being used in the source-sink junction areas, and materials such as Ge and III-V compounds are being considered for the transistor channel region of future-generation devices.
Showing 1 to 6 of 6 Books