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Epitaxial Growth of n-Type 4H-SiC on 3" Wafers for Power Devices

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Abstract:

In this paper we present recent results of epitaxial growth of 4H-SiC on 3” (0001) 8° and 4° off-oriented wafers using a multi-wafer hot-wall CVD system. This equipment exhibits a capacity of 5x3” or 7x2” wafers per run. By optimizing the process conditions epitaxial layers with excellent crystal quality, purity and homogeneity in doping and thickness were grown. The intra-wafer as well as the wafer-to-wafer homogeneity will be illustrated by doping and thickness mappings of a full-loaded run. Surface morphology of epitaxial layers on 8° and 4° off-oriented wafers was investigated by atomic force microscopy.

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Silicon Carbide and Related Materials 2004 View Preview

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Periodical:

Materials Science Forum (Volumes 483-485)

Pages:

141-146

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.483-485.141

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Online since:

May 2005

Authors:

Bernd Thomas, Christian Hecht

Keywords:

Epitaxial Layer, Hot-Wall CVD, Multi-Wafer CVD, Silicon Carbide (SiC)

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© 2005 Trans Tech Publications Ltd. All Rights Reserved

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