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Microcrystalline Silicon Thin-Films Grown by Plasma Enhanced Chemical Vapour Deposition - Growth Mechanisms and Grain Size Control

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Solid State Phenomena (Volume 93)

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257-268

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.93.257

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Online since:

June 2003

Authors:

Pere Roca i Cabarrocas, Anna Fontcuberta i Morral, Billel Kalache, Samir Kasouit

Keywords:

Hydrogen Ion Bombardment, In Situ Ellipsometry, Microcrystalline Silicon

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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